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Focused Ion Beam
A scanning electron microscope with the electron source replaced by a gallium ion gun. Used for fault analysis and modification of modern microchips and semiconductor devices. (http://www.empa.ch)
See Also: Beam
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Microscopy Software/Hardware
ZEISS Atlas 5
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Ion Beam Etch
Nexus IBE Series
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.
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Ion Beam Deposition
Create ultra-precise, high-purity, thin film layer devices with maximum uniformity and repeatability with Ion Beam Deposition (IBD) Systems.
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Trace VOC Analyzer
PTR-TOF 6000 X2
The new PTR-TOF 6000 X2 is our premium PTR-TOF trace VOC analyzer. We conceived a unique system comprising of a novel high-resolution TOF and IONICON’s PTR technology with the new “X2” features, for the ultimate PTR-TOFMS experience. X2 combines the latest generation of performance enhancing tools incl. the ION-BOOSTER funnel as well as the hexapole ION-GUIDE. The ion funnel focuses the ions into the hexapole ion guide which results in nearly lossless transmission of an extremely focused ion beam into the TOF mass spectrometer. This increases the sensitivity dramatically and also improves the instrument’s mass resolving power. Utmost resolution, sensitivity and lowest real-time detection limit are now available in a robust, transportable platform that is smaller and lighter than previous products.
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Ion Chambers
0.2 to 5000 mR/hr, 5 Ranges• Temperature Compensated• Retractable 1000 mg/cm² Beta Shield• High Background Zero Capability• Proportional Audio Output
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Ion Chromatography
940 Professional IC Vario
High-end ion chromatography system for research applications and method development
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Ion Beam Sources
Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including the industry's only Linear gridded sources.
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Ion Chromatography
930 Compact IC Flex
The 930 Compact IC Flex is a versatile ion chromatograph developed with a focus on the requirements of routine users.
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Ion Pumps & Controllers
Agilent Vacuum (formerly Varian) offers a complete portfolio of VacIon ion pumps that provide various pumping speeds (from 0.4 to 1000 L/s). Agilent also supplies smart combinations titanium sublimation pumps (Ion CombiTSP) and Non-Evaporable Getter (Ion CombiNEG) pumps for clean and vibration-free environments.Agilent ion pumps and controllers can be customized in a number of configurations to satisfy your vacuum requirements. They are the best choice for those applications where stable ultrahigh or extreme-high vacuum (UHV or XHV) conditions are essential, such as: laboratories, large research facilities, medical devices, scanning electron microscopes, and surface analysis tools.
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Beam Bender
10726A
The Keysight 10726A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This bare optic requires a user-supplied mount.
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Ion Beam Milling Systems
When material specimen surfaces are prepared for SEM or incident light microscopy, the specimen usually undergoes multiple processes until the layer or surface to be analyzed is machined with precision. Leica Microsystems’ workflow solutions for solid state technology cover all steps required for demanding high-quality sample preparation.
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Ion Source Packages
RBD Instruments provides a wide range of sputter ion sources used for sample cleaning, and depth profiling. No matter what the application, RBD provides the highest performance at the lowest price.
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Beam Load Cell
EST-70
Technopark Automation & Control
The EST-70 Shear Beam Load Cell is commonly used on platform, hopper weighing and pallet weighing applications. It is low cost and available in capacities from 500 kg to 2000 kg.
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50% Beam Splitter
10701A
The Keysight 10701A beam splitter is designed for beam diameters of 6 mm or less. It reflects one half of the total incoming laser beam, and transmits one half. The Keysight 10701A optic includes a housing for standard mounting.
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Ion Blower Guns
For manual cleaning tasks, we combine the advantages of Eltex nozzle technology with the variability of a hand-held air gun. Thus, a wide variety of shapes can be cleaned efficiently. For use in hazardous areas, we offer a special version of the ion blower guns.
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Beam Profiler
WinCamD series
CW & Pulsed laser profiling. Wavelength Range: 190 nm- 15 m*. Resolution: 5.0 m*. Smallest Beam: 42 m*.
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Specialized Beam Profiler Systems
DataRay offers specialized beam profiler systems. These systems offer solutions for complex applications. The large beam profiling system is suitable for beams up to 200 mm image area, and the line laser profiling system provides for direct measurement of line lasers up to 200 mm in length.
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Headlight Beam Testers
VLT offers a wide range of professional headlight beam testers. From simple manually operated models up to fullly automated robot type machines for use in integrated test lanes.
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*Beam Propagation Analysis
M²
M², or Beam Propagation Ratio, is a value that indicates how close a laser is to being a single mode TEM00 beam, which in turn determines how small a beam waist can be focused. For the perfect Gaussian TEM00 condition the M² equals 1. M² cannot be determined from a single beam profile measurement. The ISO/DIS 11146 requires that M² be calculated from a series of measurements. M² is measured on real beams by focusing the beam with a fixed position lens of known focal length, and then measuring the characteristics of the artificially created beam waist and divergence. We have a number of solutions for the measurement of M² ranging from simple manual processes to fully automated dedicated instruments, depending on the frequency of the need to measure M² of lasers and laser systems.
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Broad-Beam Ion Milling
Materials Evaluation and Engineering
Ion beam milling is a unique method of sample preparation that complements and significantly extends the capabilities of the traditional microscopy and metallographic laboratories.
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Camera Based Beam Profiling
BeamGage
See your beam as never before with BeamGage®. The camera-based beam profiling system consists of a camera and analysis software. Often times, this system will need to be used with beam attenuation or beam sizing accessories, depending on your laser application. The advantage to camera-based beam profiling is the real-time viewing and measuring of a laser’s structure. BeamGage software includes an extensive set of ISO quantitative measurements, features a rich graphical interface, and features its patented UltraCal™ algorithm, providing the industry’s highest accuracy measurements.
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Plasma CVD & Reactive Ion Etching System
MODEL DRIE-1100-LL-ECR
The Tek-Vac DRIE-1100-LL-ECR series systems are designed for both high-density plasma chemical vapor deposition and reactive ion etching of sub-micron integrated circuits, optical devices and RF microwave electron devices.
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Non-Contact Beam Profiler
BeamWatch
The patented BeamWatch non-contact profiling system accurately captures and analyzes industrial multi-kilowatt lasers wavelengths from 980nm - 1080nm by measuring Rayleigh Scattering. It features a complete passthrough beam measurement technique, no moving parts, and a lightweight compact design which makes it ideal for comprehensive analysis of industrial multi-kilowatt lasers
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Ion Chromatography
IC Software- MagIC Net
MagIC Net is the software to control your Metrohm ion chromatograph and any modules for liquid handling, sample preparation, and automation connected. Intuitive operation, comprehensive system monitoring, and straightforward data management make MagIC Net, what it is: the preferred software for state-of-the art ion chromatography.
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Chloride Ion Test Kit for Abrasives
134A
Contamination can build up, particularly if the blast media is recycled several times. Using the Elcometer 134A Chloride Ion Test in the field will accurately identify contamination and prevent costly surface-related failures.
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Beam Directional Power Supply Mains
SiteX CP225D
The CP225D is currently the most powerful constant potential X-Ray generator in ICM's portfolio. Supplemental to its outstanding penetration capacity (up to 47 mm for steel in just 10 minutes), it includes a built-in multiple X-Ray output carrousel that features a Beryllium window for the inspection of lighter alloys such as aluminum and carbon fiber. The CP225D is one of the most versatile generators on the market and will adapt to an extremely wide variety of applications. In fields as diverse as the construction or petrochemical industries, its power and small focal spot, light weight, compactness and high penetration capacity will be much appreciated.
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Ultra-compact Laser Collimated Beam Sensor
HL-T1
Panasonic Industrial Devices Sales Company of America
The HL-T1 Sensor is an ultra-small laser Thru-Beam Sensor with very high resolution.